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Adhesion Aspects of Thin Films, Volume 1
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Edited by: Mittal, K.L. © 2001 VSP - An imprint of BRILL

 

Description: This book, providing a commentary on the current state of knowledge of adhesion of thin films, will be useful to anyone interested in thin films and will provide ideas on how to improve or tailor adhesion of a film or a coating for a given situation.
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Front Matter
Preface
Table of Contents
Expand this node 1. Stresses in Thin Films
Expand this node 2. Fundamental Aspects of Residual Stress Evolution in Thin Metal Films During Energetic Particle Deposition
Expand this node 3. Surface Stress Effects on the Intrinsic Stress in Thin Films
Expand this node 4. Influence of the Ion Bombardment on the Stress in Thin Films Produced by Ion Beam and RF Sputtering Techniques
Expand this node 5. Delamination of Thin Hard Coatings Induced by Combined Residual Stress and Topography
Expand this node 6. Effects of Surface Treatments on the Adhesion of Metallic Films to Ceramic Substrates
Expand this node 7. The State-of-the-Art in Adhesion of CVD Diamond to Carbide Cutting Inserts
Expand this node 8. Adhesion Improvement of Diamond Films to Silicon Nitride Substrate for Cutting Tools
Expand this node 9. Quantifying the Effect of Carbon on the Practical Adhesion of Aluminum Films to Sapphire Substrates
Expand this node 10. The Effect of a Titanium-Based Interlayer on the Adhesion of Ceramic Coatings
Expand this node 11. Effect of Annealing on Residual Stress, Strength, Adhesion and Wear Resistance of Thin, Hard Coatings on Low Alloy Steel
Expand this node 12. Study of Adhesion and Tribological Properties of Some Ceramic Films
Expand this node 13. Properties of Oxide Coatings Deposited on a Plastic Substrate by a Successive Pulsed Plasma Anodisation Process
Expand this node 14. Practical Adhesion of Organic Coatings to Metals: The Role of the Interphase and Its Residual Stresses
Expand this node 15. Epoxy–Diamine Adhesives on Metals: The Interphase Formation and Characterization
Expand this node 16. Improving the Adhesion of Plasma Polymerized Thin Fluorocarbon Films on Silicon Using (CHF3 + SF6) Radio-Frequency Discharge Pretreatments